Academic and Industrial Experts Share Their Latest Perspectives on Compact Modeling and Verilog-A Standardization
The MOS-AK/GSA Modeling Working Group, a global compact modeling standardization forum, held its annual spring workshop on April 8-9 at the Sapienza Università di Roma – the largest academic institution in Europe. More than 70 international academic researchers and modeling engineers attended this year's event, which marked two decades of the MOS-AK/GSA Modeling Working Group enabling compact modeling R&D exchange. The event was organized by Marco Balucani, Fernanda Irrera and Paolo Nenzi of Sapienza Università di Roma's electronic engineering department. The workshop's technical co-sponsorship was provided by the IEEE Electron Devices Society (EDS) and the COMON FP7 Project, with direct sponsorship offered by Agilent Technologies, Micron Technology and the Micron Foundation.
"We recognize the importance of MOS-AK/GSA modeling workshops as one of the main device modeling events taking place in Europe and, more recently, in the U.S.," said Dr. Roberto Tinti, device modeling product marketing manager at Agilent's EEsof division in Santa Rosa, CA. "We were pleased to contribute to the event and present a paper about the application of Agilent's latest breakthrough technology, X-parameters for device modeling. We also selected the MOS-AK/GSA Rome workshop to introduce our newest automated software for device modeling measurements, IC-CAP ACE."
Micron Technology actively contributed with a technical poster presentation as well as organized a visit of its Avezzano facility. Micron Italia also participated by providing information on Micron's presence in Italy. The Micron Foundation and Micron Italia aim to sponsor and participate in subsequent events to further promote the scientific culture in the field of micro- and nano-electronics.
The event included a number of technical highlights contributed by leading academic and industrial experts, including Professor Asenov, University of Glasgow; Professor Baccarani, University of Bologna; Professor Iannaccone, Università degli Studi di Pisa; Dr. Marmiroli, Numonyx; Dr. Seebacher, austriamicrosystems; and Dr. Mijalkovic, Silvaco. They shared their latest perspectives on compact modeling and Verilog-A standardization in the dynamically evolving semiconductor industry and presented such topics as: the impact of statistical parameter set selection on the accuracy of statistical compact modeling; the study of current transport in nanowire FET; compact modeling of nanoscale transistors; compact models of non-volatile memories for variability evaluation; compact modeling for process variability and aging effects; and convergence aid techniques for compact modeling with Verilog-A.
The MOS-AK/GSA Modeling Working Group plans to continue its standardization efforts by organizing additional compact modeling meetings, workshops and courses throughout 2010 including:
- Analog Modeling Panel in connection with GSA & IET International Semiconductor Forum; 9:00am on May 18; London, UK; www.gsaietsemiconductorforum.com
- Special MIXDES Modeling Session; June 24-26; Wroclaw, Poland; www.mixdes.org/Special_sessions.htm
- Compact Modeling Training Course; June 30-July 1; Tarragona, Spain; www.compactmodelling.eu
- MOS-AK/GSA Modeling Workshop; Sept. 17; Seville, Spain; www.mos-ak.org/seville
- MOS-AK/GSA Modeling Meeting; Dec. 2010; San Francisco, CA; www.mos-ak.org
The activities listed above are coordinated by Wladek Grabinski who leads the MOS-AK/GSA Modeling Working Group Organizational Committee representing four global regions:
- North America: Pekka Ojala, Exar; Geoffrey Coram, Analog Devices; Jamal Deen, McMaster University; Roberto Tinti, Agilent EEsof Division
- South America: Gilson I. Wirth, UFRGS; Carlos Galup-Montoro, UFSC
- Europe: Ehrenfried Seebacher, austriamicrosystems; Sebastian Schmidt, X-FAB; Benjamin Iniguez, URV
- Asia: Goichi Yokomizo, STARC; Sadayuki Yoshitomi, Toshiba; Xing Zhou, Nanyang Technological University
About MOS-AK/GSA Modeling Working Group:
In January 2009, GSA merged its efforts with MOS-AK, a well-known industry compact modeling volunteer group primarily focused in Europe, to re-activate its Modeling Working Group. Its purpose, initiatives and deliverables coincide with MOS-AK's purpose, initiatives and deliverables. The Modeling Working Group plays a central role in developing a common language among foundries, CAD vendors, IC designers and model developers by contributing and promoting different elements of compact model standardization and related tools for model development, validation/implementation and distribution. www.gsaglobal.org/eda/index_wg.aspx
About GSA:
The Global Semiconductor Alliance (GSA) mission is to accelerate the growth and increase the return on invested capital of the global semiconductor industry by fostering a more effective fabless ecosystem through collaboration, integration and innovation. It addresses the challenges within the supply chain including IP, EDA/design, wafer manufacturing, test and packaging to enable industry-wide solutions. Providing a platform for meaningful global collaboration, the Alliance identifies and articulates market opportunities, encourages and supports entrepreneurship, and provides members with comprehensive and unique market intelligence. Members include companies throughout the supply chain representing 25 countries across the globe. www.gsaglobal.org
Contacts:
GSA
Nicole Bowman, 972-866-7579 ext. 129
Senior
Marketing Manager
nbowman@gsaglobal.org
or
MOS-AK
Wladek
Grabinski, +41 22 349 0939
MOS-AK/GSA Group Manager
wladek@grabinski.ch
